Plasma Etching: An Introduction

Dennis M. Manos , Daniel L. Flamm

Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.
  • Limba : Engleza
  • Cuprins : D.L. Flamm and G.K. Herb, Plasma Etching Technology. An Overview. D.L. Flamm, Introduction to Plasma Chemistry. S.A. Cohen, An Introduction to Plasma Physics for Materials Processing. D.M. Manos and H.F. Dylla, Diagnostics of Plasmas for Materials Processing. A.R. Reinberg, Plasma Etch Equipment and Technology. J.M.E. Harper, Ion Beam Etching. G.K. Herb, Safety, Health, and Engineering Considerations for Plasma Processing.
  • Data Publicarii : 08 Sep 1989
  • Format : Hardback
  • Numar pagini : 476
  • ISBN : 9780124693708
692.99 Lei
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